Fabrication of the Superhydrophobic Surface Using SU-8 Photoresist with Black Silicon

被引:0
|
作者
Lee, Sang Eon [1 ]
Lee, Dongjin [1 ]
Kim, Jin-Ha [1 ]
Lee, Kang Won [1 ]
Lee, Kwang-Cheol
Hong, Seong Uk
Lee, Seung S. [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Taejon, South Korea
关键词
hydrophobic; black silicon; SU-8;
D O I
暂无
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
A novel change method of surface wettability using both micro- and nano-sized geometrical shape is presented in this paper. After the black silicon is formed in reactive ion etching, SU-8 mold is fabricated on top of the black silicon that has nano-sized holes. After the microfabrication of SU-8 photoresist mold, poly-dimethygloxane (PDMS) is poured into the mold. As a result, the molded PDMS surface has both micro- and nano-sized structures, which is similar to lotus leaf. The diameter of cylindrical pillar microstructures ranges from 50 to 100 mu m. The water contact angle of 150 degrees is obtained on the molded PDMS surface with pillars diameter of 50 mu m. The superhydrophobic surface made of micro- and nanostructures is straightforwardly formed, increasing water contact angle on the engineered surface.
引用
收藏
页码:407 / 410
页数:4
相关论文
共 50 条
  • [1] A superhydrophobic chip based on SU-8 photoresist pillars suspended on a silicon nitride membrane
    Marinaro, Giovanni
    Accardo, Angelo
    De Angelis, Francesco
    Dane, Thomas
    Weinhausen, Britta
    Burghammer, Manfred
    Riekel, Christian
    LAB ON A CHIP, 2014, 14 (19) : 3705 - 3709
  • [2] Three-dimension photonic crystals fabrication using SU-8 photoresist
    Zhang, Xiao-Yu
    Gao, Hong-Tao
    Zhou, Chong-Xi
    Liu, Qiang
    Xing, Ting-Wen
    Yao, Han-Min
    Guangdian Gongcheng/Opto-Electronic Engineering, 2007, 34 (08): : 28 - 31
  • [3] Fabrication of inkjet-printed SU-8 photoresist microlenses using hydrophilic confinement
    Chen, Wei-Chih
    Wu, Tsung-Ju
    Wu, Wen-Jong
    Su, Guo-Dung J.
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2013, 23 (06)
  • [4] Fabrication and tests of a three-dimensional microsupercapacitor using SU-8 photoresist as the separator
    Xing, Hexin
    Wang, Xiaohong
    Shen, Caiwei
    Li, Siwei
    MICRO & NANO LETTERS, 2012, 7 (12) : 1166 - 1169
  • [5] Fabrication of Atomic Force Microscope Probe with Low Spring Constant Using SU-8 Photoresist
    Lee, Jaekul
    Shin, Hyunjung
    Kim, Sungdong
    Hong, Seungbum
    Chung, Juhwan
    Park, Hongsik
    Moon, Jooho
    2003, Japan Society of Applied Physics (42):
  • [6] Fabrication of optical structures using SU-8 photoresist and chemically assisted ion beam etching
    Pang, L
    Nakagawa, W
    Fainman, Y
    OPTICAL ENGINEERING, 2003, 42 (10) : 2912 - 2917
  • [7] Fabrication of atomic force microscope probe with low spring constant using SU-8 photoresist
    Lee, J
    Shin, H
    Kim, S
    Hong, S
    Chung, J
    Park, H
    Moon, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2003, 42 (10A): : L1171 - L1174
  • [8] Indirect removal of SU-8 photoresist using PDMS technique
    Li, JH
    Chen, D
    Zhang, JY
    Liu, JQ
    Zhu, J
    SENSORS AND ACTUATORS A-PHYSICAL, 2006, 125 (02) : 586 - 589
  • [9] Fabrication of an array of microcavities utilizing SU-8 photoresist as an alternative `LIGA' technology
    Roberts, Kevin
    Williamson, Fred
    Cibuzar, Greg
    Thomas, Lowell
    Biennial University/Government/Industry Microelectronics Symposium - Proceedings, 1999, : 139 - 141
  • [10] Use of a photoresist sacrificial layer with SU-8 electroplating mould in MEMS fabrication
    Song, IH
    Ajmera, PK
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2003, 13 (06) : 816 - 821