Electrical characteristics of the Al/p-type silicon/2,9,16,23-tetrakis-{6-(-thiophene-2-carboxylate)-hexylthio} phthalocyaninato cobalt(II) organic semiconductor contact have been investigated by current-voltage and capacitance-voltage measurements. The ideality factor (1.33), barrier height (0.90 eV) and series resistance (314.5 k Omega) of the Al/p-Si/CoPc contact were obtained from current-voltage characteristics. The barrier height obtained for the Al/p-Si/CoPc diode is significantly higher than that of obtained for the conventional Al/p-Si Schottky diode. The CoPc organic layer modifies the effective barrier height of Al/p-Si Schottky diode as the organic film forms a physical barrier between Al metal and the p-Si. The interface-state density of the diode was determined and interface-state density was found to vary from 1.23x 10(14) eV(-1) cm(-2) to 0.69 x 10(14) eV(-1) cm(-2). It is evaluated that the CoPc organic layer modifies electrical parameters and interface properties of Al/p-Si junction. (c) 2008 Elsevier B.V. All rights reserved.
机构:
Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, ChinaInstitute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Xie, Hongwei
Li, Xunshuan
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Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, ChinaInstitute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Li, Xunshuan
Wang, Ying
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Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, ChinaInstitute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Wang, Ying
Ma, Chaozhu
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Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, ChinaInstitute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Ma, Chaozhu
Wang, Runsheng
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Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, ChinaInstitute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Wang, Runsheng
Li, Ronghua
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Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, ChinaInstitute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Li, Ronghua
Song, Chang'an
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机构:
Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, ChinaInstitute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Song, Chang'an
Peng, Yingquan
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机构:
Institute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Key Laboratory for Magnetism and Magnetic Materials, Lanzhou University, Lanzhou 730000, ChinaInstitute of Microelectronics, School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, China
Peng, Yingquan
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology,
2010,
30
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: 347
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350