Extended theory of soft x-ray reflection for realistic lamellar multilayer gratings

被引:9
|
作者
van der Meer, R. [1 ,2 ]
Kozhevnikov, I. V. [3 ]
Bastiaens, H. M. J. [2 ]
Boller, K. -J. [2 ]
Bijkerk, F. [1 ,2 ,4 ]
机构
[1] Univ Twente, MESA, Ind Focus Grp XUV Opt, NL-7500 AE Enschede, Netherlands
[2] Univ Twente, MESA, NL-7500 AE Enschede, Netherlands
[3] Russian Acad Sci, Inst Crystallog, Moscow 119333, Russia
[4] FOM Inst DIFFER, NL-3430 BE Nieuwegein, Netherlands
来源
OPTICS EXPRESS | 2013年 / 21卷 / 11期
关键词
DIFFRACTION; SCATTERING; REGION; OPTICS;
D O I
10.1364/OE.21.013105
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
An extended set of coupled wave equations were derived to describe non-idealized lamellar multilayer grating structures with properties as obtained with state-of-the-art fabrication techniques. These generalized equations can include all relevant effects describing the influence of passivation and contamination layers, non-rectangular lamel profiles and sidewall scalloping. The calculations showed that passivation and contamination plays an important role in that it may significantly reduce peak reflectivity. However, we also derived a condition for layer thicknesses having negligible effects. Slightly positive tapered lamel profiles are shown to further reduce the bandwidth as compared to a rectangular lamel profile, whereas negative tapers significantly increased the bandwidth. The influence of intriguing effects, such as the sidewall scalloping caused by Bosch Deep Reactive Ion Etching, are also modeled. We identified the signature of such scalloping as additional side peaks in the reflectivity spectrum and present parameters with which these can be effectively suppressed. (C) 2013 Optical Society of America
引用
收藏
页码:13105 / 13117
页数:13
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