Development of critical dimension measurement scanning electron microscope for ULSI(S-8000series)

被引：4
|
作者：
Ezumi, M [1 ]
Otaka, T [1 ]
Mori, H [1 ]
Todokoro, H [1 ]
机构：
[1] HITACHI LTD,INSTRUMENT DIV,HITACHINAKA,IBARAKI 312,JAPAN
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY X | 1996年 / 2725卷
关键词：
critical dimension measurement scanning electron microscope; schottky emission; retarding; ExB deflection;
D O I：
10.1117/12.240146
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：105 / 113
页数：9
相关论文
共 50 条
  • [1] Critical dimension measurement scanning electron microscope for ULSI
    Otaka, Tadashi
    Mori, Hiroyoshi
    Yamada, Osamu
    Todokoro, Hideo
    Hitachi Review, 1995, 44 (02):
  • [2] CRITICAL DIMENSION MEASUREMENT IN THE SCANNING ELECTRON-MICROSCOPE
    POSTEK, MT
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1984, 480 : 109 - 119
  • [3] Systematic Measurement Uncertainty of Critical Dimension Scanning Electron Microscope
    Abe, Hideaki
    Kadowaki, Motoki
    Hamaguchi, Akira
    Ikeda, Takahiro
    Yamazaki, Yuichiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (06) : 06GD031 - 06GD035
  • [4] Systematic measurement uncertainty of critical dimension scanning electron microscope
    Advanced Integration Technology Group 2, Advanced Memory Integration Development Department, Advanced Memory Development Center, Yokkaichi, Mie 512-8550, Japan
    不详
    Jpn. J. Appl. Phys., 1600, 6 PART 2 (06GD031-06GD035):
  • [5] Measurement of critical dimension in scanning electron microscope mask images
    Lee, Wonsuk
    Han, Sang Hyun
    Jeong, Hong
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2011, 10 (02):
  • [6] Experimental resolution measurement in critical dimension scanning electron microscope metrology
    Lorusso, GF
    Joy, DC
    SCANNING, 2003, 25 (04) : 175 - 180
  • [7] Study of Measurement Condition Optimization in Critical Dimension-Scanning Electron Microscope
    Hitomi, Keiichiro
    Nakayama, Yoshinori
    Yamanashi, Hiromasa
    Sohda, Yasunari
    Kawada, Hiroki
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (08) : 6554 - 6557
  • [8] Critical dimension guarantee for the next generation photomasks with critical dimension scanning electron microscope
    Iwamatsu, T
    Hiruta, K
    Morimoto, H
    Ataka, M
    Nitta, J
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (04): : 1264 - 1268
  • [9] Hybrid metrology co-optimization of critical dimension scanning electron microscope and optical critical dimension
    Vaid, Alok
    Osorio, Carmen
    Tsai, Jamie
    Bozdog, Cornel
    Sendelbach, Matthew
    Grubner, Eyal
    Koret, Roy
    Wolfling, Shay
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2014, 13 (04):
  • [10] Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes
    Hotta, Shoji
    Sutani, Takumichi
    Halle, Scott
    Moore, Daniel
    Archie, Chas
    Sugiyama, Akiyuki
    Ikeno, Masahiko
    Yamaguchi, Atsuko
    Torii, Kazuyoshi
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2011, 10 (02):
12345