Release-etch modeling for complex surface micromachined structures

被引：0
|
作者：
Eaton, WP [1 ]
Smith, JH [1 ]
Jarecki, RL [1 ]
机构：
[1] SANDIA NATL LABS,INTEGRATED MICROMECH MICROSENSORS & CMOS TECNOL D,ALBUQUERQUE,NM 87185
来源：
MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY II | 1996年 / 2879卷
关键词：
release etch; surface micromachining;
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：80 / 93
页数：14
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