Characterization of 3C-SiC epilayers grown on 6H-SiC substrates by vacuum sublimation

被引:11
|
作者
Savkina, N [1 ]
Tregubova, A [1 ]
Scheglov, M [1 ]
Solov'ev, V [1 ]
Volkova, A [1 ]
Lebedev, A [1 ]
机构
[1] IOFFE Inst, St Petersburg 194021, Russia
关键词
3C-SiC epilayer; surface morphology; optical microscopy; X-ray diffraction; EBIC; SE;
D O I
10.1016/S0921-5107(01)01053-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cubic silicon carbide (3C-SiC) epilayers with different double position boundaries (DPBs) and stacking faults (SF) density grown on n-6H-SiC Lely substrates by vacuum sublimation epitaxy were characterized by optical microscopy after oxidation in dry O-2 at 1100 degreesC and X-ray topography. Using the methods of electron beam-induced current (EBIC) and secondary electrons (SE), the intermediate 6H-SiC layer at the interface between 3C-SiC epilayer with high DPBs and SF density and 6H-SiC substrate was detected. Triangular shape regions crossing the upper 3C-SiC epilayer represent local p-n junctions and look like the cross-section transmission electron microscopy (TEM) images of structures with SF. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:317 / 320
页数:4
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