ALD, ALE and, 2D Materials: Atomic Scale Processing for Optoelectronics Applications

被引：0
|
作者：
Knoops, Harm [1 ,2 ]
机构：
[1] Tech Univ Eindhoven, Eindhoven, Netherlands
[2] Oxford Instruments Plasma Technol, Bristol, Avon, England
来源：
2017 ASIA COMMUNICATIONS AND PHOTONICS CONFERENCE (ACP) | 2017年
关键词：
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页数：1
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