High resolution imaging and lithography with hard x rays using parabolic compound refractive lenses

被引：36

作者：

Schroer, CG ^{[1
]}

Benner, B

Günzler, TF

Kuhlmann, M

Zimprich, C

Lengeler, B

Rau, C

Weitkamp, T

Snigirev, A

Snigireva, I

Appenzeller, J

机构：

[1] Rhein Westfal TH Aachen, Inst Phys 2, D-52056 Aachen, Germany

[2] European Synchrotron Radiat Facil, F-38043 Grenoble, France

[3] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2002年 / 73卷 / 03期

关键词：

D O I：

10.1063/1.1445827

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Parabolic compound refractive lenses are high quality optical components for hard x rays. They are particularly suited for full field imaging, with applications in microscopy and x-ray lithography. Taking advantage of the large penetration depth of hard x rays, the interior of opaque samples can be imaged with submicrometer resolution. To obtain the three-dimensional structure of a sample, microscopy is combined with tomographic techniques. In a first hard x-ray lithography experiment, parabolic compound refractive lenses have been used to project the reduced image of a lithography mask onto a resist. Future developments are discussed. (C) 2002 American Institute of Physics.

引用

页码：1640 / 1642

页数：3

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