Photocurable resists for imprint lithography.

被引：0
|
作者：
Carter, KR [1 ]
机构：
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 229卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
107-PMSE
引用
收藏
页码：U1119 / U1119
页数：1
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