Refined grating fabrication using Displacement Talbot Lithography

High-resolution grating areas with none stitching error are in demanding needs but usually expensive and hard to prepare. In this paper, we present a method of making refined grating areas from coarse photolithography mask using Displacement Talbot Lithography (DTL). DTL is relatively simple and low-cost system based on mask photolithography for high-resolution periodic structures over large areas. The grating periods on the ordinary coarse photolithography mask was designed as 3.552 pm. By patterning gratings on Si3N4 film deposited on fused silica as intervening phase masks, the final prepared grating periods shrinks 8 times, down to 444 nm. This technology is suitable for producing large area high resolution gratings to reduce the research cost, and, can be applied to applications such as DFB laser production, LED substrates preparation and other relative fields. (C) 2017 Elsevier B.V. All rights reserved.