Controlled stacking growth of uniform InAs quantum dots by molecular beam epitaxy

被引：8
|
作者：
Suzuki, Y [1 ]
Kaizu, T [1 ]
Yamaguchi, K [1 ]
机构：
[1] Univ Electrocommun, Dept Elect Engn, Tokyo 1828585, Japan
来源：
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES | 2004年 / 21卷 / 2-4期
关键词：
quantum dot; stacking growth; InAs; molecular beam epitaxy;
D O I：
10.1016/j.physe.2003.11.073
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Double-stacked InAs quantum dots (QDs) were grown by molecular beam epitaxy via Stranski-Krastanov growth mode. Transition of the facet formation from {136} plane to {110} plane was observed during the stacking growth of InAs QDs by reflection high-energy electron-beam diffraction. The enhanced growth rate and the different facet formation in the stacking growth were caused by tensile strain of the GaAs underlying layer. Low arsenic pressure and low growth rate conditions played an important role for a perfect coupling and uniformity in the size of the stacked QDs. The narrow photoluminescence line width of 17.6 meV was successfully obtained from the stacked InAs QDs. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：555 / 559
页数：5
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