Plasma Lens Focusing of an Intense Electron Beam formed by a Vacuum Arc Plasma Electron Source

被引：0

作者：

Gushenets, V. I. ^{[1
]}

Goncharov, A. A. ^{[2
]}

Dobrovolskiy, A. M. ^{[2
]}

Dunets, S. P. ^{[2
]}

Litovko, I. V. ^{[3
]}

Oks, E. M. ^{[1
]}

Bugaev, A. S. ^{[1
]}

机构：

[1] SB RAS, High Current Elect Inst, Tomsk 634955, Russia

[2] NAS Ukraine, Inst Phys, UA-03028 Kiev, Ukraine

[3] NAS Ukraine, Inst Nucl Res, UA-03650 Kiev, Ukraine

来源：

25TH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM (ISDEIV 2012) | 2012年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper presents research results on focusing and transport of an intense (up to 100 A) nonrelativistic (up to 20 kV) pulsed electron beam using a positive space charge plasma lens. The electron source is based on electron extraction from the plasma of a hollow-anode vacuum arc discharge. The arc is initiated by a dielectric surface flashover. The emission hole is covered with a fine mesh grid. The beam is extracted and accelerated in a diode-type electron-optical system formed between the grid surface and an open anode plasma boundary. The anode plasma is produced in an electron beam transport channel by residual gas ionization by beam electrons and the plasma lens discharge. The plasma lens configuration of crossed electric and magnetic fields provides an attractive means for obtaining a stable low-pressure plasma discharge. This geometry allows compression of the electron beam from 6 cm to 1 cm in diameter with more than 100 A/cm(2) beam current density at the collector.

引用

页码：599 / 602

页数：4

共 50 条

[41] An electron-beam plasma source and geometry for plasma processing
Schatz, Ken D.
Ruzic, David N.
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1993, 2 (02):
[42] Electron beam generation in a diode with a gaseous plasma electron source I: Plasma source based on a hollow anode ignited by a multi-arc system
Krokhmal, A
Gleizer, JZ
Krasik, YE
Felsteiner, J
Gushenets, VI
JOURNAL OF APPLIED PHYSICS, 2003, 94 (01) : 44 - 54
[43] Runaway electron production during intense electron beam penetration in dense plasma
Parks, P. B.
Cowan, T. E.
PHYSICS OF PLASMAS, 2007, 14 (01)
[44] Forevacuum plasma source of continuous electron beam
Klimov, Aleksandr
Bakeev, Ilya
Oks, Efim
Zenin, Aleksey
LASER AND PARTICLE BEAMS, 2019, 37 (02) : 203 - 208
[45] Plasma source for ion and electron beam lithography
Lee, Y
Gough, RA
Leung, KN
Vujic, J
Williams, MD
Zahir, N
Fallman, W
Tockler, M
Bruenger, W
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06): : 3367 - 3369
[46] Observations of underdense plasma lens focusing of relativistic electron beams
Thompson, M. C.
Badakov, H.
Rosenzweig, J. B.
Travish, G.
Fliller, R.
Kazakevich, G. M.
Piot, P.
Santucci, J.
Li, J.
Tikhoplav, R.
2007 IEEE PARTICLE ACCELERATOR CONFERENCE, VOLS 1-11, 2007, : 3754 - +
[47] Density Profile of a Plasma Layer Formed by an Electron Beam
I. A. Sorokin
E. G. Shustin
Plasma Physics Reports, 2018, 44 : 1164 - 1168
[48] Density Profile of a Plasma Layer Formed by an Electron Beam
Sorokin, I. A.
Shustin, E. G.
PLASMA PHYSICS REPORTS, 2018, 44 (12) : 1164 - 1168
[49] A long pulse width and high extraction rate arc plasma electron beam source
S. Gao
S. X. Chen
K. Chen
Z. C. Ji
J. Chen
Instruments and Experimental Techniques, 2017, 60 : 705 - 709
[50] Stability of electron beam generation by forevacuum-pressure plasma-cathode electron beam source based on a cathodic arc
Burdovitsin, Victor A.
Kazakov, Andrey V.
Medovnik, Alexander V.
Oks, Efim M.
PHYSICS OF PLASMAS, 2018, 25 (07)

← 1 2 3 4 5 →