Anisotropy;
magnetic films and multilayers;
magnetic measurements;
metals and alloys;
X-ray diffraction;
MEDIA;
D O I:
10.1109/TMAG.2015.2435054
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
We herein investigate the performance of L1(0)-FePt(001) films consisting of magnetically anisotropic-graded FePt layers grown by gradient working pressure (P-w). The graded structures typically consist of 5 nm thick FePt hard layer followed by five sequential layers of 1 nm thick graded-FePt layers deposited with P-w of 30, 20, 10, 7, and 3 mtorr, respectively. The structural and magnetic properties of P-w-graded-FePt layers thus fabricated on glass substrates are compared with that of those grown at different deposition temperatures, T-d of 300 degrees C, 350 degrees C, 400 degrees C, and 450 degrees C. The FePt(P-w)-graded films exhibited a very high (001)-texture, island-like morphology, and strong perpendicular magnetic anisotropy and these performances are found to be consistent with that of the L1(0)-FePt(001) hard layer. For T-d < 400 degrees C, the FePt(P-w)-graded films not only showed remarkable declining trend for out-of-plane coercivity (H-c perpendicular to) but also demonstrated single-phase magnetization reversal-suggesting the existence of strong exchange coupling between the hard and the graded layers. In contrast, at higher T-d (>= 400 degrees C) ledge-or maze-type morphology with evidence of in-plane magnetic component is observed. Further, higher T-d leads to the occurrence of intensive interlayer diffusion across the graded layers, which resulted in declining exchange-coupling behavior. The cross-sectional transmission electron microscopy images revealed epitaxial growth for the P-w-graded and the L1(0)-FePt layers grown using MgO under layer. The results of this paper demonstrate the feasibility of obtaining magnetic gradation in the FePt(w)-graded films, satisfying the requirements of future magnetic recording with ultrahigh density.
机构:
Center for Materials Research and Analysis, University of Nebraska, Lincoln, NE 68588, United StatesCenter for Materials Research and Analysis, University of Nebraska, Lincoln, NE 68588, United States
Yan, M.L.
Xu, Y.F.
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机构:
Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588, United StatesCenter for Materials Research and Analysis, University of Nebraska, Lincoln, NE 68588, United States
Xu, Y.F.
Li, X.Z.
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机构:
Center for Materials Research and Analysis, University of Nebraska, Lincoln, NE 68588, United StatesCenter for Materials Research and Analysis, University of Nebraska, Lincoln, NE 68588, United States
Li, X.Z.
Sellmyer, D.J.
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机构:
Center for Materials Research and Analysis, University of Nebraska, Lincoln, NE 68588, United States
Department of Physics and Astronomy, University of Nebraska, Lincoln, NE 68588, United StatesCenter for Materials Research and Analysis, University of Nebraska, Lincoln, NE 68588, United States
机构:
Natl Inst Sci Educ & Res NISER, Bhubaneswar 751005, Orissa, IndiaNatl Inst Sci Educ & Res NISER, Bhubaneswar 751005, Orissa, India
Mallick, Sougata
Bedanta, Subhankar
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Natl Inst Sci Educ & Res NISER, Bhubaneswar 751005, Orissa, IndiaNatl Inst Sci Educ & Res NISER, Bhubaneswar 751005, Orissa, India
Bedanta, Subhankar
Seki, Takeshi
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机构:
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, JapanNatl Inst Sci Educ & Res NISER, Bhubaneswar 751005, Orissa, India
Seki, Takeshi
Takanashi, Koki
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机构:
Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
Japan Sci & Technol Agcy, CREST, Chiyoda Ku, Tokyo 1020075, JapanNatl Inst Sci Educ & Res NISER, Bhubaneswar 751005, Orissa, India