Characteristics of thin films of hexagonal boron nitride mixed with copper controlled by a magnetron co-sputtering deposition technique

被引:15
|
作者
Goto, M
Kasahara, A
Tosa, M
Kimura, T
Yoshihara, K
机构
[1] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050003, Japan
[2] Natl Inst Mat Sci, Mat Engn Lab, Tsukuba, Ibaraki 3050047, Japan
关键词
surface energy; internal stress; surface morphology; thin film; hexagonal boron nitride;
D O I
10.1016/S0169-4332(01)00552-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin film properties, such as surface morphology, internal stress and surface energy, of hexagonal boron nitride/copper mixtures, produced by a magnetron co-sputtering deposition technique, were investigated. Techniques included scanning electron microscopy, film deflection and contact angle measurements. It was possible to fabricate nano-scale islands on the surface of the film and to control the size of the islands by adjusting the sputter discharge conditions. The internal stress and surface energy can be significantly modified depending on these conditions indicating that they are dependent variables. This technique of co-sputtering deposition is a promising candidate for the control of nano-structures on a surface and for controlling internal stress and surface energy. (C) 2002 Elsevier Science B.V. All fights reserved.
引用
收藏
页码:172 / 176
页数:5
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