Optimization of ultraviolet laser doping for crystalline silicon solar cells with a novel segmented selective emitter design

被引:2
|
作者
Renshaw, John S. [1 ,2 ]
Upadhyaya, Ajay [2 ]
Upadhyaya, Vijaykumar [2 ]
Cooper, Ian B. [2 ]
Rohatgi, Ajeet [2 ,3 ]
机构
[1] Georgia Inst Technol, Dept Phys, Atlanta, GA 30332 USA
[2] Georgia Inst Technol, Univ Ctr Excellence Photovolta, Atlanta, GA 30332 USA
[3] Suniva Inc, Norcross, GA 30092 USA
来源
PROGRESS IN PHOTOVOLTAICS | 2013年 / 21卷 / 02期
关键词
silicon solar cell; laser doping; emitter etchback; EFFICIENCY;
D O I
10.1002/pip.2316
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
This paper reports on the use of ultraviolet laser for forming segmented selective emitters on POCl 3 n +pp + solar cells. Laser scan speed, pulse power, and repetition rate are optimized to minimize laser-induced defects, which are found to enhance recombination and reduce the local open-circuit voltage. Laser-doped selective emitters formed by locally driving in additional phosphorous from the diffusion glass are well suited for an etchback process without the need for a mask. In this paper, we show a novel selective emitter design that is segmented instead of continuous, combined with an emitter etchback process gives an efficiency improvement of about 0.3% absolute over a standard industrial type solar cell and 0.2% absolute improvement over a non-segmented selective emitter solar cell. Copyright (c) 2012 John Wiley & Sons, Ltd.
引用
收藏
页码:141 / 147
页数:7
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