A double-plasma source of continuous bipolar ion-ion beam

被引:6
|
作者
Dudin, S. V. [1 ,2 ]
Rafalskyi, D. V. [3 ]
机构
[1] Kharkov Natl Univ, Dept Phys & Technol, UA-61108 Kharkov, Ukraine
[2] Sci Ctr Phys Technol, UA-61022 Kharkov, Ukraine
[3] Ecole Polytech, CNRS, Lab Phys Plasmas, F-91128 Palaiseau, France
关键词
ELECTRON-BEAM; EXTRACTION;
D O I
10.1063/1.4788711
中图分类号
O59 [应用物理学];
学科分类号
摘要
A double-plasma source capable of the generation of a continuous bipolar ion-ion beam is described. The quasi-neutral ion-ion flow to an extraction electrode is formed in the system containing primary inductively coupled plasma separated from a secondary plasma by an electrostatic grid-type filter. The total current of each ion species to the 250mm diameter extraction electrode is about 80mA; the electron current does not exceed 30% of the ion current. Method of positive/negative ion current ratio control is proposed, allowing the ion currents ratio variation in wide range. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4788711]
引用
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页数:4
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