A new gas purifier for ArF excimer lasers

被引：4

作者：

Ito, S

Saito, T

Tada, A

机构：

[1] Opto-Electronics Res. Laboratories, NEC Corporation, Miyamae-ku, Kawasaki, Kanagawa 216, 1-1, Miyazaki

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1996年 / 67卷 / 03期

关键词：

D O I：

10.1063/1.1146837

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We have developed a new gas purifier for ArF excimer lasers that can remove all the impurities from degraded ArF excimer laser gas. We found that cooled activated charcoal at temperatures below -50 degrees C effectively removes CF4, which is the preponderant impurity generated in ArF excimer laser gas mixtures. We also demonstrated that the new gas purifier can regenerate the ArF excimer laser gas up to its initial purity level after about 1X10(9) shots of operation. (C) 1996 American Institute of Physics.

引用

页码：658 / 661

页数：4

共 50 条

[21] Gas contaminant effect in a discharge-excited ArF excimer laser
Saito, T
Ito, S
APPLIED PHYSICS B-LASERS AND OPTICS, 1998, 66 (05): : 579 - 583
[22] BETTER GAS HANDLING BOOSTS PERFORMANCE OF EXCIMER LASERS
KARWACKI, EJ
HANTON, SD
LASER FOCUS WORLD, 1992, 28 (03): : 81 - &
[23] AUTOMATIC REPLACEMENT OF THE GAS-MIXTURE IN EXCIMER LASERS
ZUBRILIN, NG
KORENYUK, PI
TKACHENKO, ON
CHERNOMORETS, MP
KVANTOVAYA ELEKTRONIKA, 1990, 17 (02): : 202 - 204
[24] Durable excimer lasers find new applications
Lerner, EJ
LASER FOCUS WORLD, 1998, 34 (07): : 131 - +
[25] Photo-triggering and secondary electron produced ionization in electric discharge ArF* excimer lasers
Xiong, Zhongmin
Kushner, Mark J.
JOURNAL OF APPLIED PHYSICS, 2011, 110 (08)
[26] COMPARISON OF THE EFFECTS OF ARGON FLUORIDE (ARF) AND KRYPTON FLUORIDE (KRF) EXCIMER LASERS ON OCULAR STRUCTURES
PEYMAN, GA
KUSZAK, JR
BERTRAM, BA
WECKSTROM, K
MANNONEN, I
VIHERKOSKI, E
INTERNATIONAL OPHTHALMOLOGY, 1985, 8 (04) : 199 - 209
[27] APPLICATIONS OF DOPING AND DEDOPING OF TEFLON AF FILMS IN MICROFABRICATION USING KRF AND ARF EXCIMER LASERS
HIRAOKA, H
LAZARE, S
APPLIED SURFACE SCIENCE, 1990, 46 (1-4) : 342 - 347
[28] Excimer ArF laser with an output energy of 0.5 J and He buffer gas
Zhupikov, A.A.
Razhev, A.M.
Kvantovaya Elektronika (Moscow), 24 (08): : 683 - 688
[29] Excimer ArF laser with an output energy of 0.5 J and He buffer gas
Institute of Laser Physics, Siberian Division, Russian Academy of Sciences, prospekt Lavrent'eva 13/3, 630090 Novosibirsk, Russia
Quantum Electron., 8 (665-669):
[30] Characterization of GaAs surfaces treated with phosphine gas photodecomposed by an ArF excimer laser
Sugino, T
Ninomiya, H
Shirafuji, J
Matsuda, K
APPLIED PHYSICS LETTERS, 1998, 72 (12) : 1472 - 1474

← 1 2 3 4 5 →