Electrical properties of Fe doped NiO Thin Films

被引：0
|
作者：
Moghe, Shweta [1 ]
Acharya, A. D. [1 ]
Panda, Richa [2 ]
Shrivastava, S. B. [1 ]
Gangrade, Mohan [3 ]
Ganesan, V. [3 ]
机构：
[1] Vikram Univ, Ujjain, Madhya Pradesh, India
[2] Acropolis Inst Technol & Res Bhopal, Bhopal, India
[3] UGC DAE Consortium Sci Res, Indore 452001, India
来源：
SOLID STATE PHYSICS, PTS 1 AND 2 | 2012年 / 1447卷
关键词：
NiO thin films; Spray Pyrolysis; Fe doped;
D O I：
10.1063/1.4710079
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Undoped and Fe doped nickel oxide thin films were grown on glass substrate by chemical spray pyrolysis technique using NiCl2 center dot 6H(2)O as the precursor solution. Fe concentrations in the films were varied from 0-10 %. The effect of doping on the properties such as microstructure and resistivity were studied. The prepared films are reproducible, adherent to the substrate and uniform.
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收藏
页码：461 / +
页数：2
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