Impact of multi-layer deposition method on defects for EUVL photomask blanks

被引：0

作者：

Cullins, Jerry ^{[1
]}

Motai, Kumi ^{[1
]}

Nisiyama, Iwao ^{[1
]}

机构：

[1] Assoc Super Adv Elect Technol, NTT Atsugi R&D, Morinosato Wakamiya 3-1, Atsugi, Kanagawa 2430198, Japan

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES X, PTS 1 AND 2 | 2006年 / 6151卷

关键词：

mask; photomask; multi-layer deposition; defects; ion beam; magnetron;

D O I：

10.1117/12.656931

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This paper is a summary of the work to date done by the ASET consortia to look at the impact of deposition method on defects. The study includes scratch and bump type defects coated with EUVL quality multi-layers using Magnetron Sputtering, Ion Beam Sputtering, or Ion Beam Sputtering with a secondary ion etch. After the deposition TEM samples were taken of the individual defects and the impact of the deposition method on the multi-layers was examined.

引用

页码：U1028 / U1036

页数：9

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