FAILURE INVESTIGATION AND ANALYSIS OF ABNORMAL CAPACITANCE OF ACCELEROMETER AFTER ICP RELEASE

被引:0
|
作者
An, Ping [1 ]
He, Yandong [1 ]
Wang, Shitao [1 ]
Bai, Yanping [1 ]
Hao, Yilong [1 ]
机构
[1] Peking Univ, Inst Microelect, Beijing 100871, Peoples R China
来源
MICRONANO2008-2ND INTERNATIONAL CONFERENCE ON INTEGRATION AND COMMERCIALIZATION OF MICRO AND NANOSYSTEMS, PROCEEDINGS | 2008年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An abnormal capacitance case Of capacitive accelerometer after inductive coupled plasma (ICP) release was investigated to solve the failure problem. scanning electron microscopy (SEM)/transmission electron microscopy (TEM), energy dispersive x-ray spectroscopy (EDX), X-Ray transmission inspection, epoxy resin filling/polishing were used to identify the possible root cause. Failure analysis results confirmed that abnormal capacitance occurred by some connecting combs. Based on the results of three ways to analysis, it was concluded that the abnormal capacitance was not due to the contamination between combs of accelerometer and the substrate, but due to the connection between some combs caused by the ICP etching ununiformity. The static capacitance and resistance test results also testified this conclusion.
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页码:659 / 663
页数:5
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