Electrode limited currents in amorphous Ge-S-Ga thin films

被引:4
|
作者
Petkov, P
Ivanova, ZG
Vassilev, V
机构
[1] BULGARIAN ACAD SCI,INST SOLID STATE PHYS,BU-1784 SOFIA,BULGARIA
[2] UNIV CHEM TECHNOL & MET,DEPT PHYS,SOFIA 1784,BULGARIA
[3] UNIV CHEM TECHNOL & MET,DEPT SEMICOND,SOFIA 1784,BULGARIA
关键词
amorphous materials; band structure; conductivity; deposition process;
D O I
10.1016/S0040-6090(97)00159-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The direct current (de) conductivity of Al-(Ge-S-Ga)-Al samples has been investigated at high applied electric fields up to 1 . 10(8) V m(-1) at room temperature, and the electrical transport in the thermionic and thermionic-field emission modes. From the current-voltage characteristics, the values of the electron work function chi at the Al/Ge-S-Ga interface, the relative dielectric permittivy epsilon of the layers and the effective electron mass m(c)/m in the conduction band have been determined. The experimental results are in agreement with Christov's theory for injected electron currents through the potential barrier. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:315 / 318
页数:4
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