Comparison of carbon deposition on tungsten between molecular dynamics and dynamic Monte Carlo simulation

被引：14
|
作者：
Inai, Kensuke [1 ]
Kikuhara, Y. [1 ]
Ohya, Kam [2 ]
机构：
[1] Univ Tokushima, Grad Sch Adv Technol & Sci, Tokushima 7708506, Japan
[2] Univ Tokushima, Inst Sci & Technol, Tokushima 7708506, Japan
来源：
SURFACE & COATINGS TECHNOLOGY | 2008年 / 202卷 / 22-23期
基金：
日本学术振兴会;
关键词：
Molecular dynamics simulation; Dynamic Monte Carlo simulation; Ion-solid interactions; Tungsten; Carbon;
D O I：
10.1016/j.surfcoat.2008.06.016
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
To investigate the low-temperature plasma wall interactions in fusion devices, e.g., ITER, we have developed a molecular dynamics (MD) simulation code. The calculated results are compared with the dynamic Monte Carlo (MC) simulation. The W surface is bombarded with C atoms at the temperature of 10 eV-1keV. During the plasma exposure with low temperature, a thick C layer is formed on the W surface. At high plasma temperature W surface is eroded and the W-C mixed layer is formed. These results are consistent with the calculated ones with the dynamic MC code, EDDY [K. Ohya, Phys. Scr. T124, (2006) 70.]. Inhomogeneous deposition of C is calculated, which indicates that atomic scale roughness is important for the development of C deposition and material mixing. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：5374 / 5378
页数：5
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