Study on a new method of applying external stress to MOS device

被引：1

作者：

Feng, Qiu ^{[1
]}

Wang, Guilian ^{[1
]}

Ding, Guifu ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, Res Inst Micro Nano Sci & Technol, Natl Key Lab Sci & Technol Micro Nano Fabricat, Shanghai 200240, Peoples R China

来源：

INDUSTRIAL INSTRUMENTATION AND CONTROL SYSTEMS II, PTS 1-3 | 2013年 / 336-338卷

关键词：

film stress; MEMS; VDMOS;

D O I：

10.4028/www.scientific.net/AMM.336-338.1578

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

The electrical characteristic of MOS device is susceptible to the external mechanical stress. In order to investigate the effect, the four-point bending technique has been used by many researchers to apply stress on the device. In this paper, a new way for applying stress to MOS device has been presented. The stress is applied by a metallic film which is deposited on the backside of the chip. It's convenient to apply different stress to each chip on the wafer. The above method is used to study the influence of stress on the performance of VDMOS device. The results show that the on-resistance decreases about 3% and 8% with the compressive stress of 50MPa and 70MPa respectively.

引用

页码：1578 / 1581

页数：4

共 50 条

[41] A Drain-Extended MOS Device With Spreading Filament Under ESD Stress
Shrivastava, Mayank
Gossner, Harald
Russ, Christian
IEEE ELECTRON DEVICE LETTERS, 2012, 33 (09) : 1294 - 1296
[42] Application of a new stress measurement device in underground marble quarrying, a case study
Iabichino, G.
Cravero, M.
ROCK STRESS AND EARTHQUAKES, 2010, : 499 - 504
[43] A new device for stress monitoring of ancient masonry buildings: Pilot study and results
Blanco, Haydee
Boffill, Yosbel
Lombillo, Ignacio
Villegas, Luis
STRUCTURAL CONTROL & HEALTH MONITORING, 2018, 25 (08):
[44] MOS depletion-mode thyristor: A new MOS-controlled bipolar power device.
Baliga, B.Jayant
Chang, Hsueh-Rong
Electron device letters, 1988, 9 (08): : 411 - 413
[45] Applying a code clone detection method to domain analysis of device drivers
Ma, Yu-Seung
Woo, Duk-Kuyn
14TH ASIA-PACIFIC SOFTWARE ENGINEERING CONFERENCE, PROCEEDINGS, 2007, : 254 - +
[46] Efficacy of an external urethral device in women with genuine stress urinary incontinence
Versi E.
Harvey M.-A.
International Urogynecology Journal, 1998, 9 (5) : 271 - 274
[47] A new method of applying drugs to the posterior urethra
Gross, CJ
CANADIAN MEDICAL ASSOCIATION JOURNAL, 1921, 11 : 464 - 464
[48] NEW METHOD OF APPLYING WEAR RESISTANT COATINGS
SHEWELL, DE
METAL PROGRESS, 1983, 124 (06): : 41 - &
[49] NEW METHOD FOR APPLYING LIQUID SEED TREATMENTS
LEACH, SS
AMERICAN POTATO JOURNAL, 1971, 48 (08): : 308 - &
[50] A new method of applying radium through the cystoscope
Buerger, L
JOURNAL OF UROLOGY, 1923, 9 (03): : 227 - 239

← 1 2 3 4 5 →