Selective-area atomic layer deposition with microcontact printed self-assembled octadecyltrichlorosilane monolayers as mask layers

被引：59
|
作者：
Farm, Elina [1 ]
Kemell, Marianna [1 ]
Ritala, Mikko [1 ]
Leskela, Markku [1 ]
机构：
[1] Univ Helsinki, Inorgan Chem Lab, Dept Chem, FI-00014 Helsinki, Finland
来源：
THIN SOLID FILMS | 2008年 / 517卷 / 02期
基金：
芬兰科学院;
关键词：
Selective-area atomic layer deposition; Self-assembled monolayer; Octadecyltrichlorosilane; Iridium; Titanium oxide;
D O I：
10.1016/j.tsf.2008.08.191
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Selective-area atomic layer deposition (ALD) was studied using microcontact printed self-assembled monolayers (SAM) as growth preventing mask layers. Patterned self-assembled octadecyltrichlorosilane (OTS, H(3)C(CH(2))(17)SiCl(3)) monolayers were prepared on the silicon (100) surface by an elastomeric stamp which had 1.5 mu m wide parallel print lines with 1.5 mu m wide spaces in between. Passivation properties of the monolayers against ALD growth were verified by ALD processes of iridium and TiO(2). Iridium was grown at 225 degrees C and TiO(2) at 250 degrees C. The quality of SAM was controlled by water contact angle measurements. Patterned iridium and TiO(2) films were studied with field emission scanning electron microscope and energy dispersive X-ray spectrometer. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：972 / 975
页数：4
相关论文
共 50 条
  • [21] Defects in microcontact-printed and solution-grown self-assembled monolayers
    Eberhardt, AS
    Nyquist, RM
    Parikh, AN
    Zawodzinski, T
    Swanson, BI
    LANGMUIR, 1999, 15 (05) : 1595 - 1598
  • [22] Molecular Mechanism of Selective Al2O3 Atomic Layer Deposition on Self-Assembled Monolayers
    Choi, Youngjin
    Kim, Hyeng Jin
    Kim, Eunchan
    Kang, Huiyeong
    Park, Junhyeok
    Do, Young Rag
    Kwak, Kyungwon
    Cho, Minhaeng
    ACS APPLIED MATERIALS & INTERFACES, 2023, 15 (34) : 41170 - 41179
  • [23] Ion-selective lipid bilayers tethered to microcontact printed self-assembled monolayers containing cholesterol derivatives
    Jenkins, ATA
    Bushby, RJ
    Boden, N
    Evans, SD
    Knowles, PF
    Liu, QY
    Miles, RE
    Ogier, SD
    LANGMUIR, 1998, 14 (17) : 4675 - 4678
  • [24] Selective deposition of ZnO onto self-assembled monolayers
    Saito, N
    Haneda, H
    Koumoto, K
    ASIAN CERAMIC SCIENCE FOR ELECTRONICS II AND ELECTROCERAMICS IN JAPAN V, PROCEEDINGS, 2002, 228-2 : 113 - 118
  • [25] Area-Selective Atomic Layer Deposition Using Self-Assembled Monolayer and Scanning Probe Lithography
    Lee, Wonyoung
    Prinz, Fritz B.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2009, 156 (09) : G125 - G128
  • [26] Soft removal of stearic acid self-assembled monolayer for area-selective atomic layer deposition
    Lopez-Gonzalez, L. E.
    Guerrero-Sanchez, J.
    Tiznado, H.
    SURFACES AND INTERFACES, 2023, 41
  • [27] Area-selective atomic layer deposition of platinum on YSZ substrates using microcontact printed SAMs
    Jiang, Xirong
    Bent, Stacey F.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2007, 154 (12) : D648 - D656
  • [28] Sum frequency generation microscopy of microcontact-printed mixed self-assembled monolayers
    Cimatu, K
    Baldelli, S
    JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (04): : 1807 - 1813
  • [29] Pattern design in large area using octadecyltrichlorosilane self-assembled monolayers as resist material
    Jiang, Peng
    Li, Shun-Yu
    Sugimura, Hiroyuki
    Takai, Osamu
    APPLIED SURFACE SCIENCE, 2006, 252 (12) : 4230 - 4235
  • [30] Area-selective atomic layer deposition of Ru thin films using phosphonic acid self-assembled monolayers for metal/dielectric selectivity
    Lee, Seo-Hyun
    Lee, Jeong-Min
    Lee, Ji Hun
    Kwak, Junghun
    Chung, Sung-Woong
    Kim, Woo - Hee
    MATERIALS LETTERS, 2022, 328
12345