Comparative Study of Pd/B4C X-ray Multilayer Mirrors Fabricated by Magnetron Sputtering with Kr and Ar Gas

被引:16
|
作者
Ni, Hangjian [1 ]
Huang, Qiushi [1 ]
Liu, Genchang [1 ]
Qi, Runze [1 ]
Zhang, Zhong [1 ]
Li, Xiuhong [2 ]
Li, Zhongliang [2 ]
Wang, Jie [2 ]
Wang, Zhanshan [1 ]
机构
[1] Tongji Univ, Sch Phys Sci & Engn, Inst Precis Opt Engn, Key Lab Adv Microstruct Mat MOE, Shanghai 200092, Peoples R China
[2] Chinese Acad Sci, Shanghai Adv Res Inst, Zhangheng Rd 239, Shanghai 201204, Peoples R China
基金
中国国家自然科学基金; 国家重点研发计划;
关键词
Pd; B4C; multilayer; interface quality; heavy noble gas; hard X-ray; BLAZED GRATINGS; INTERFACE;
D O I
10.3390/ma13204504
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ultrathin Pd/B4C multilayers are suitable X-ray mirrors working at the photon energy region of 7-20 keV. To further improve the layer structure, Pd/B4C multilayers with a d-spacing of 2.5 nm were fabricated by magnetron sputtering using the heavy noble gas Kr and compared with the conventional ones fabricated by Ar. Although the Kr-sputtering process can work at a lower pressure, the interface width-especially the interface roughness-is a little larger than that made by Ar. A stronger polycrystallization and a lower content of sputter gas atoms were found in the Kr-made sample, which can be explained by the joint effect from less recoiled particles and lower sputtering pressure. A good reflectance of 68% of the Kr made multilayer was measured at 10 keV, which is only slightly lower than that of the Ar made sample (71%).
引用
收藏
页码:1 / 10
页数:10
相关论文
共 50 条
  • [41] Hard X-ray attosecond pulse reflection from realistic W/B4C multilayer structures
    Wang, Yue
    Li, Bin
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2021, 1001
  • [42] Interface study and performance of large layer pair ultra-short period W/B4C x-ray multilayer
    Pradhan, P. C.
    Nayak, M.
    Mondal, P.
    Lodha, G. S.
    PROCEEDINGS OF THE 59TH DAE SOLID STATE PHYSICS SYMPOSIUM 2014 (SOLID STATE PHYSICS), 2015, 1665
  • [43] Thermally induced structural modification in Pt/C X-ray multilayer mirrors fabricated by electron beam evaporation
    Lodha, GS
    Pandita, S
    Gupta, A
    Nandedkar, RV
    Yamashita, K
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1996, 62 (01): : 29 - 32
  • [44] Interface study of a high-performance W/B4C X-ray mirror
    Siffalovic, Peter
    Jergel, Matej
    Chitu, Livia
    Majkova, Eva
    Matko, Igor
    Luby, Stefan
    Timmann, Andreas
    Roth, Stephan Volker
    Keckes, Jozef
    Maier, Guenter Alois
    Hembd, Alexandra
    Hertlein, Frank
    Wiesmann, Joerg
    JOURNAL OF APPLIED CRYSTALLOGRAPHY, 2010, 43 : 1431 - 1439
  • [45] X-ray and EPR study of reactions between B4C and TiO2
    Kakazey, M
    Vlasova, M
    Gonzalez-Rodriguez, JG
    Dominguez-Patiño, M
    Leder, R
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2006, 418 (1-2): : 111 - 114
  • [46] Aperiodic W/B4C multilayer systems for X-ray optics: Quantitative determination of layer thickness by HAADF-STEM and X-ray reflectivity
    Haeussler, D.
    Morawe, Ch.
    Ross, U.
    Oeguet, B.
    Spiecker, E.
    Jaeger, W.
    Hertlein, F.
    Heidorn, U.
    Wiesmann, J.
    SURFACE & COATINGS TECHNOLOGY, 2010, 204 (12-13): : 1929 - 1932
  • [47] In-situ GISAXS monitoring of ultrashort period W/B4C multilayer X-ray mirror growth
    Hodas, Martin
    Siffalovic, Peter
    Halahovets, Yuriy
    Pelletta, Marco
    Vegso, Karol
    Jergel, Matej
    Majkova, Eva
    ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS X, 2015, 9588
  • [48] Interaction of ultrashort x-ray pulses with B4C, SiC, and Si
    Bergh, M.
    Timneanu, N.
    Hau-Riege, S. P.
    Scott, H. A.
    PHYSICAL REVIEW E, 2008, 77 (02):
  • [49] Characterization of heat-treated CN films fabricated by dual-facing-target sputtering for soft X-ray multilayer mirrors
    Bai, H.L.
    Jiang, E.Y.
    Wu, P.
    Lou, Z.D.
    Wang, Y.
    Wang, C.D.
    Applied Physics A: Materials Science and Processing, 1999, 69 (06): : 641 - 647
  • [50] Characterization of heat-treated CN films fabricated by dual-facing-target sputtering for soft X-ray multilayer mirrors
    Bai, HL
    Jiang, EY
    Wu, P
    Lou, ZD
    Wang, Y
    Wang, CD
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (06): : 641 - 647