Application of photo-etching of polytetrafluoroethylene induced by high energy synchrotron radiation to LIGA

被引：7
|
作者：
Kido, Hideki [1 ]
Kuroki, Tomoyuki [2 ]
Okubo, Masaaki [2 ]
Utsumi, Yuichi [1 ]
机构：
[1] Univ Hyogo, LASTI, Hyogo 6781205, Japan
[2] Osaka Prefecture Univ, Grad Sch Engn, Hyogo 6781205, Japan
来源：
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2013年 / 19卷 / 03期
关键词：
POLYMERS;
D O I：
10.1007/s00542-012-1472-6
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Polytetrafluoroethylene (PTFE) microstructures' processing characteristics using X-ray photo decomposition and desorption are studied in the highest energy region (2-12 keV). While the exposed surface states are seen melting and boiling from the remaining bubble structure of the irradiated surface, basic photochemistry of PTFE is also same as previous reports. Surface modification of PTFE from hydrophobic to hydrophilic was investigated in order to bond PTFE sheets to a brass substrate. Then, we have a successfully fabricated Ni microstructure by LIGA process using PTFE photo-etching using high energy X-ray. Proposed LIGA using SR-photo-etching of PTFE can simplify the total process, and it can ensure that dimensional errors remain small due to swelling in developer and electroplating bath.
引用
收藏
页码：301 / 307
页数：7
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