Magnetron Sputtering Applied in Ni-Mn-Ga Films Preparation

被引：0
|
作者：
Shi, Jiazi [1 ,2 ]
Chen, Chuanzhong [1 ]
Dang, Xing [3 ]
机构：
[1] Shandong Univ, Sch Mat Sci & Engn, Minist Educ, Key Lab Liquid Solid Struct Evolut & Proc Mat, Jinan 250061, Shandong, Peoples R China
[2] Beijing City Univ, Dept Urban Construct, Beijing 100083, Peoples R China
[3] State Intellectual Property Off, Beijing 100088, Peoples R China
来源：
ADVANCED MATERIALS DESIGN AND MECHANICS | 2012年 / 569卷
关键词：
Ferromagnetic shape memory alloys; magnetron sputtering; Ni-Mn-Ga films; SHAPE-MEMORY ALLOYS; THIN-FILM;
D O I：
10.4028/www.scientific.net/AMR.569.7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Shape memory alloys (SMAs) thin films have attracted much attention in recent years as intelligent and functional materials because of their unique properties. Ferromagnetic shape memory alloys (FSMAs) show large straining output, high impetus and short response time induced by the magnetic field, compared with traditional shape memory alloys. In this paper, Ni-Mn-Ga ferromagnetic shape memory alloys flims prepared by magnetron sputtering are introduced, and the research direction of Ni-Mn-Ga films is presented.
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页码：7 / +
页数：2
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