Local laser oxidation of titanium film for the post-fabrication trimming of photonic integrated circuits

被引：1

作者：

Tronev, Aleksandr, V ^{[1
]}

Parfenov, Mikhail, V ^{[1
]}

Bozhko, Sergey I. ^{[2
]}

Ionov, Andrey M. ^{[2
]}

Mozhchil, Rais N. ^{[2
]}

Chekmazov, Sergry, V ^{[2
]}

Agruzov, Peter M. ^{[1
]}

Ilichev, Igor, V ^{[1
]}

Shamrai, Aleksandr, V ^{[1
]}

机构：

[1] Ioffe Inst, Lab Quantum Elect, St Petersburg 194021, Russia

[2] Osipyan Inst Solid State Phys Russian Acad Sci, Lab Semicond Surfaces Spect, Chernogolovka 142432, Russia

来源：

OPTICAL MATERIALS EXPRESS | 2022年 / 12卷 / 10期

基金：

俄罗斯科学基金会;

关键词：

OPTICAL WAVE-GUIDES; REFRACTIVE-INDEX; THIN-FILM; RING RESONATORS; SILICON; SURFACE;

D O I：

10.1364/OME.465690

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Local laser oxidation of a thin titanium film is considered as a means of a precise adjustment of losses and effective refractive index of dielectric optical waveguides. A fine phase control of an operating point and extinction ratio enhancement up to 57 dB were demonstrated using an integrated optical Ti:LiNbO3 Mach-Zehnder modulator. This technique only slightly affects the dielectric waveguide material and is very promising for a high precision permanent trimming of photonic devices based on dielectric waveguides of different material platforms and fabrication technologies.(c) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement

引用

页码：4072 / 4087

页数：16

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