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Current-Voltage Model of Bulk Fin Field-Effect Transistors with a Half-Circle Corner
被引:0
|作者:
Choi, Byung-Kil
[1
]
Jeong, Min-Kyu
[3
,4
]
Kwon, Hyuck-In
[2
]
Park, Byung-Gook
[3
,4
]
Lee, Jong-Ho
[3
,4
]
机构:
[1] SK Hynix Inc, Memory R&D Div, Ichon 467701, Gyeonggi, South Korea
[2] Chung Ang Univ, Sch Elect & Elect Engn, Seoul 156756, South Korea
[3] Seoul Natl Univ, ISRC, Seoul 151742, South Korea
[4] Seoul Natl Univ, Dept Elect Engn & Comp Sci, Seoul 151742, South Korea
关键词:
DRAIN-CURRENT MODEL;
DOUBLE-GATE;
D O I:
10.7567/JJAP.52.064202
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The drain current of fully depleted (FD) nanoscale bulk FinFETs with the top-channel of a half-circle shape was modeled, for the first time, systematically in all operational regions and compared with the data obtained from three-dimensional (3D) device simulation. In the current model of these devices, it is very important to have accurate threshold voltages for side-channels and top-channel, and take the field penetration effect induced by the top-gate near the top of a fin body into account the threshold voltage (Vth) models for top-channels and side-channels, respectively. So, we obtained successfully the Vth models [Vth(0,t) (Vth model of top-channel at a low drain bias) and Vth(0,s) (Vth model of side-channels at a low drain bias)] considering the field penetration effect for both channels (top-and side-channels) to model the current behaviors in the doped bulk FinFETs with the top-channel of a half-circle shape. Our compact current model with Vth(0,t) and Vth(0,s) predicted accurately the current behaviors of the devices and shown a good agreement with 3D simulation. (C) 2013 The Japan Society of Applied Physics
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