Plasma polymerised thin films for flexible electronic applications

被引:44
|
作者
Jacob, Mohan V. [1 ]
Olsen, Natalie S. [1 ]
Anderson, Liam J. [1 ]
Bazaka, Kateryna [1 ]
Shanks, Robert A. [2 ]
机构
[1] James Cook Univ, Sch Engn & Phys Sci, Elect Mat Res Lab, Townsville, Qld 4811, Australia
[2] RMIT Univ, Melbourne, Vic 3001, Australia
关键词
Thin film; Flexible electronics; Plasma polymerisation; Optical properties; Mechanical properties; ESSENTIAL OIL; POLYTERPENOL; FABRICATION; INHALATION; DELIVERY;
D O I
10.1016/j.tsf.2013.05.023
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The significant advancement and growth of organic and flexible electronic applications demand materials with enhanced properties. This paper reports the fabrication of a nonsynthetic polymer thin film using radio frequency plasma polymerisation of 3,7-dimethyl-1,6-octadien-3-ol. The fabricated optically transparent thin film exhibited refractive index of approximately 1.55 at 500 nm and rate of deposition was estimated to be 40 nm/min. The surface morphology and chemical properties of the thin films were also reported in this paper. The optical band gap of the material is around 2.8 eV. The force of adhesion and Young's modulus of the linalool polymer thin films were measured using force-displacement curves obtained from a scanning probe microscope. The friction coefficient of linalool polymer thin films was measured using the nanoscratch test. The calculated Young's modulus increased linearly with increase in input power while the friction coefficient decreased. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:167 / 170
页数:4
相关论文
共 50 条
  • [31] Ultra-thin flexible ceramic substrates for electronic applications
    Olenick, J.A., 1600, IMAPS-International Microelectronics and Packaging Society (41):
  • [32] Characterization of thin semiconductor films for (OPTO) electronic applications
    Elmiger, JR
    Feist, H
    Kunst, M
    MICROWAVE PROCESSING OF MATERIALS V, 1996, 430 : 267 - 272
  • [33] Fullerene-60 thin films for electronic applications
    Al-Mohamad, A
    Allaf, AW
    SYNTHETIC METALS, 1999, 104 (01) : 39 - 44
  • [34] Electronic properties, devices and applications of diamond thin films
    Deneuville, A
    COMPTES RENDUS DE L ACADEMIE DES SCIENCES SERIE IV PHYSIQUE ASTROPHYSIQUE, 2000, 1 (01): : 81 - 90
  • [35] THIN FILMS AND THICK FILMS FOR ELECTRONIC APPLICATIONS - A MATERIALS AND PROCESSES REVIEW
    RAIRDEN, JR
    AMERICAN CERAMIC SOCIETY BULLETIN, 1969, 48 (08): : 805 - &
  • [36] Spectroscopic ellipsometry study of plasma-polymerised vinyltriethoxysilane films
    Mistrik, J.
    Cechalova, B.
    Studynka, J.
    Cech, V.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2009, 20 : 451 - 455
  • [37] Spectroscopic ellipsometry study of plasma-polymerised vinyltriethoxysilane films
    J. Mistrik
    B. Cechalova
    J. Studynka
    V. Cech
    Journal of Materials Science: Materials in Electronics, 2009, 20 : 451 - 455
  • [38] Graphene Oxide Thin Films for Flexible Nonvolatile Memory Applications
    Jeong, Hu Young
    Kim, Jong Yun
    Kim, Jeong Won
    Hwang, Jin Ok
    Kim, Ji-Eun
    Lee, Jeong Yong
    Yoon, Tae Hyun
    Cho, Byung Jin
    Kim, Sang Ouk
    Ruoff, Rodney S.
    Choi, Sung-Yool
    NANO LETTERS, 2010, 10 (11) : 4381 - 4386
  • [39] Effect of argon plasma treatment on electronic properties of doped hydrogenated Silicon thin films for photovoltaic applications
    Jain, Manmohan
    Juneja, Sucheta
    Lodhi, Kalpana
    Kant, Chander
    Kumar, Sushil
    Jain, Mohit
    Dutt, Ateet
    Matsumoto, Yasuhiro
    2021 18TH INTERNATIONAL CONFERENCE ON ELECTRICAL ENGINEERING, COMPUTING SCIENCE AND AUTOMATIC CONTROL (CCE 2021), 2021,
  • [40] Parameter Study by Infrared and Morphological Investigations of Plasma-Polymerised Thin Silicon Nitride Films Deposited with the Plasmodul
    Schulz, Andreas
    Steiner, Leni
    Krueger, Jochen
    Schweitzer, Ulrich
    Walker, Matthias
    Stroth, Ulrich
    PLASMA PROCESSES AND POLYMERS, 2007, 4 : S826 - S830