Structural characterization of lamellar multilayer gratings by x-ray reflectivity and scanning electron microscopy

被引：14

作者：

Jergel, M

Mikulík, P

Majková, E

Luby, S

Senderák, R

Pincík, E

Brunel, M

Hudek, P

Kostic, I

Konecníková, A

机构：

[1] Slovak Acad Sci, Inst Phys, Bratislava 84228, Slovakia

[2] Masaryk Univ, Fac Sci, Lab Thin Films & Nanostruct, CS-61137 Brno, Czech Republic

[3] Slovak Acad Sci, Inst Comp Syst, Bratislava 84237, Slovakia

[4] CNRS, Cristallog Lab, F-38042 Grenoble 09, France

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1999年 / 32卷 / 10A期

关键词：

D O I：

10.1088/0022-3727/32/10A/343

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Structural characterization of a fully etched amorphous W/Si multilayer grating with lateral periodicity 800 nm is performed by x-ray reflectivity. Grating truncation rod profiles have been calculated using a matrix modal eigenvalue approach of the dynamical theory of reflectivity by gratings which generalizes the Fresnel transmission and reflection coefficients for lateral diffraction. The interface roughness in rough gratings has been taken into account by a coherent amplitude approach which damps the generalized Fresnel coefficients. Scanning electron microscopy pictures complete the study.

引用

页码：A220 / A223

页数：4

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