Synthesis of Embedded Titanium Dioxide Nanoparticles by Oxygen Ion Implantation in Titanium Films

被引：2

作者：

Rukade, Deepti. A. ^{[1
]}

Desai, C. A.

Kulkarni, Nilesh

Tribedi, L. C.

Bhattacharyya, Varsha ^{[1
]}

机构：

[1] Univ Bombay, Dept Phys, Bombay 400098, Maharashtra, India

来源：

SOLID STATE PHYSICS, VOL 57 | 2013年 / 1512卷

关键词：

thin films; ion implantation; titaniumdioxide nanoparticles;

D O I：

10.1063/1.4791070

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin films of titanium of 100nm thickness are deposited on fused silica substrates. These films are implanted by oxygen ions with implantation energy of 60keV obtained from ECR based highly charged ion accelerator. The implanted films are later annealed in a tube furnace to establish nanophase formation. The post implanted annealed films are characterized by UV-Visible Spectroscopy and Glancing Angle X-ray Diffraction technique (GAXRD). The phase formed and particle size is determined by GAXRD. Nanoparticle formation is confirmed by the UV-VIS spectroscopic analysis that shows quantum size effects in the form of a blue shift in the band-gap energy of titanium-oxide.

引用

页码：380 / 381

页数：2

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