Chlorine chemisorption and reaction on the Si(111) surface and its characterization using second-harmonic generation

被引：6
|
作者：
Haraichi, S
Sasaki, F
机构：
[1] Electrotechnical Laboratory, Tsukuba-shi, Ibaraki 305
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1997年 / 15卷 / 03期
关键词：
D O I：
10.1116/1.580723
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The electronic states of the Cl-chemisorbed Si(111) surface and the basic characteristics of laser-induced surface reaction of the Si(111)/Cl system have been studied using second-harmonic generation (SHG). The SHG spectrum from the Cl-chemisorbed Si(111) surface showed resonance peaks involving the chlorine-induced electronic states at 1.6 and 2 eV. The laser-induced surface reaction of the Si(111)/Cl system was strongly affected by the interference between the pump and probe beams. (C) 1997 American Vacuum Society.
引用
收藏
页码：871 / 874
页数：4
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