New Deposition Technique for Metal Films Containing Inorganic Fullerene-Like (IF) Nanoparticles

被引：1

作者：

Goldbart, Ohad ^{[1
]}

Yoffe, Alexander ^{[2
]}

Cohen, Sidney R. ^{[2
]}

Rosentsveig, Rita ^{[1
]}

Feldman, Yishay ^{[2
]}

Rapoport, Lev ^{[3
]}

Tenne, Reshef ^{[1
]}

机构：

[1] Weizmann Inst Sci, Dept Mat & Interfaces, IL-76100 Rehovot, Israel

[2] Weizmann Inst Sci, Dept Chem Res Support, IL-76100 Rehovot, Israel

[3] Holon Inst Technol, Dept Sci, IL-58102 Holon, Israel

来源：

CHEMPHYSCHEM | 2013年 / 14卷 / 10期

基金：

以色列科学基金会;

关键词：

physical vapor deposition; nanostructures; thin films; titanium; tribology; CONTACT;

D O I：

10.1002/cphc.201201003

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

This study describes a new method for fabrication of thin composite films using physical vapor deposition (PVD). Titanium (Ti) and hybrid films of titanium containing tungsten disulphide nanoparticles with inorganic fullerene-like structure (Ti/IF-WS2) were fabricated with a modified PVD machine. The evaporation process includes the pulsed deposition of IF-WS2 by a sprayer head. This process results in IF-WS2 nanoparticles embedded in a Ti matrix. The layers were characterized by various techniques, which confirm the composition and structure of the hybrid film. The Ti/IF-WS2 shows better wear resistance and a lower friction coefficient when compared to the Ti layer or Ti substrate. The Ti/IF films show very good antireflective properties in the visible and near-IR region. Such films may find numerous applications, for example, in the aerospace and medical technology.

引用

页码：2125 / 2131

页数：7

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