共 50 条
- [31] Bufferlayer and caplayer engineering of Mo/Si EUVL multilayer mirrors SOFT X-RAY AND EUV IMAGING SYSTEMS II, 2001, 4506 : 113 - 120
- [32] EUV damage threshold measurements of Mo/Si multilayer mirrors APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2012, 108 (02): : 263 - 267
- [33] Structure and performance of Si/Mo multilayer mirrors for the extreme ultraviolet Journal of Applied Physics, 1994, 76 (04): : 2144 - 2156
- [34] Developments in realistic design for aperiodic Mo/Si multilayer mirrors OPTICS EXPRESS, 2006, 14 (21): : 10073 - 10078
- [35] Quantum Confinement Effect in a Nanoscale Mo/Si Multilayer Structure JOURNAL OF PHYSICAL CHEMISTRY C, 2020, 124 (32): : 17795 - 17805
- [37] Mo/Si multilayer mirrors with 300-bilayers for EUV lithography PHOTOMASK JAPAN 2015: PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XXII, 2015, 9658