1.3 μm InAs/GaAs quantum dots directly capped with GaAs grown by metal-organic chemical vapor deposition

被引:2
|
作者
Huang, KF
Hsieh, TP
Yeh, NT
Ho, WJ
Chyi, JI
Wu, MC [1 ]
机构
[1] Natl Tsing Hua Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[2] Natl Cent Univ, Dept Elect Engn, Chungli 320, Taiwan
[3] Chungha Telecom Co Ltd, Telecommun Labs, Yangmei 326, Taiwan
关键词
photoluminescence; metalorganic chemical vapor deposition; quantum dots;
D O I
10.1016/j.jcrysgro.2003.12.066
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In this paper, we investigate the effects of growth temperature and growth rate on the formation of InAs/GaAs quantum dots (QDs) grown by metalorganic chemical vapor deposition. These QDs are formed with large InAs coverage (3.0 MLs) and periodic growth interruption via the Stranski-Krastanow epitaxial growth mode. The photoluminescence (PL) spectra at 300 K exhibit a red shift in peak wavelength by decreasing the InAs growth temperature from 540degreesC to 500degreesC. As the growth rate increases from 0.05 to 0.2ML/s at a growth temperature of 500degreesC, the PL linewidth decreases and the PL intensity increases. These results are related to the In clusters and uniformity of InAs/GaAs QDs, which are observed by scanning electron microscopy (SEM). Finally, the room-temperature PL spectrum of InAs/GaAs QDs directly capped with GaAs layer shows an emission wavelength at 1.35 mum and a narrow linewidth of 30.8 meV. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:128 / 133
页数:6
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