Diffusion;
Electromigration;
Tunneling;
Current induced switching;
Memristive behavior;
D O I:
10.1016/j.jmmm.2008.08.088
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Ultra-thin magnetic tunnel junctions with low resistive MgO tunnel barriers are prepared to examine their stability under large current stress. The devices show magnetoresistance ratios of up to 110% and an area resistance product of down to 4.4 Omega mu m(2). If a large current is applied, a reversible resistance change is observed, which can be attributed to two different processes during stressing and one relaxation process afterwards. Here, we analyze the time dependence of the resistance and use a simple model to explain the observed behavior. The explanation is further supported by numerical fits to the data in order to quantify the timescales of the involved phenomena. (C) 2008 Elsevier B.V. All rights reserved.
机构:
Univ Illinois Urban Champaign, Dept Phys, Urbana, IL 61801 USAUniv Illinois Urban Champaign, Dept Phys, Urbana, IL 61801 USA
Zhao, Han
Mehio, Omar
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机构:Univ Illinois Urban Champaign, Dept Phys, Urbana, IL 61801 USA
Mehio, Omar
Park, Wan Kyu
论文数: 0引用数: 0
h-index: 0
机构:Univ Illinois Urban Champaign, Dept Phys, Urbana, IL 61801 USA
Park, Wan Kyu
Greene, Laura H.
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机构:
Florida State Univ, Natl High Magnet Field Lab, Tallahassee, FL 32310 USA
Florida State Univ, Dept Phys, Tallahassee, FL 32310 USAUniv Illinois Urban Champaign, Dept Phys, Urbana, IL 61801 USA
机构:
Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
NIST, Gaithersburg, MD 20899 USAUniv Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA
Barcikowski, Z. S.
Pomeroy, J. M.
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h-index: 0
机构:
NIST, Gaithersburg, MD 20899 USAUniv Maryland, Dept Mat Sci & Engn, College Pk, MD 20740 USA