Electrochromic properties of nickel oxide based thin films sputter deposited in the presence of water vapor

被引:30
|
作者
Green, S. V. [1 ,2 ]
Watanabe, M. [2 ]
Oka, N. [2 ]
Niklasson, G. A. [1 ]
Granqvist, C. G. [1 ]
Shigesato, Y. [2 ]
机构
[1] Uppsala Univ, Dept Engn Sci, Angstrom Lab, SE-75121 Uppsala, Sweden
[2] Aoyama Gakuin Univ, Grad Sch Sci & Engn, Sagamihara, Kanagawa 2525258, Japan
基金
瑞典研究理事会;
关键词
Nickel oxide; Electrochromism; RF magnetron sputtering; Water vapor; Thin film; Optical properties; Charge capacity; TUNGSTEN-OXIDE; HYDRATED NIOY; DISCHARGE; HYDROXIDE; WINDOWS;
D O I
10.1016/j.tsf.2011.08.030
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electrochromic nickel oxide based thin films were prepared by reactive RF magnetron sputtering from metallic nickel in the presence of Ar, O-2 and H2O. The water vapor led to enhanced optical modulation and charge capacity. At a wavelength of 550 nm the bleached state transmittance was 0.73 and the transmittance for the colored state was 0.28 and 0.15 for water partial pressures of p(H2O)<10(-3) Pa and p(H2O) similar to 7 x 10(-2) Pa, respectively. The charge densities were 14 and 25 mC/cm(2) for p(H2O)<10(-3) Pa and P-H2O similar to 7 x 10(-2) Pa, respectively. The coloration efficiency was decreased with increased water partial pressure, from about 0.07 to 0.06 cm(2)/mC. Preliminary results show that the H2O promotes an amorphous structure and makes the films increasingly hydrous. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:3839 / 3842
页数:4
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