Morphology in-Design Deposition of HfO2 Thin Films

被引：17

作者：

Jie, Ni ^{[1
]}

Yu, Zhu ^{[1
]}

Qin, Zhou ^{[1
]}

Zhengjun, Zhang ^{[1
]}

机构：

[1] Tsinghua Univ, Dept Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 2008年 / 91卷 / 10期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1111/j.1551-2916.2008.02654.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We investigated factors influencing the growth morphology of hafnium dioxide (HfO2) thin films by glancing angle deposition, and found that a shape factor defined as the ratio of the deposition rate over the substrate rotation speed played a key role in determining the morphology of the films. By adjusting this factor, we fabricated successfully films of aligned HfO2 nanorods, nanosprings, and nanohelix. Comparing with the flat films, these nanostructured films exhibited enhanced light transmittance and photocatalytic activity in hydrogen production from water splitting under ultraviolet radiation.

引用

页码：3458 / 3460

页数：3

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