Performance of Thin-Film Ferroelectric Capacitors for EMC Decoupling

被引:1
|
作者
Li, Huadong [1 ]
Subramanyam, Guru [1 ]
机构
[1] Univ Dayton, Dept Elect & Comp Engn, Dayton, OH 45469 USA
关键词
D O I
10.1109/TUFFC.2008.971
中图分类号
O42 [声学];
学科分类号
070206 ; 082403 ;
摘要
This paper studied the effects of thin-film ferroelectrics as decoupling capacitors for electromagnetic compatibility applications. The impedance and insertion loss of PZT capacitors were measured and compared with the results from commercial off-the-shelf capacitors. An equivalent circuit model was extracted from the experimental results, and a considerable series resistance was found to exist in ferroelectric capacitors. This resistance gives rise to the observed performance difference around series resonance between ferroelectric PZT capacitors and normal capacitors. Measurements on paraelectric (Ba,Sr)TiO3-based integrated varactors do not show this significant resistance. Some analyses were made to investigate the mechanisms, and it was found that it can be due to the hysteresis in the ferroelectric thin films.
引用
收藏
页码:2552 / 2558
页数:7
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