Preparation of DC Reactive Magnetron Sputtered ZnO Thin Film Towards Photovoltaic Applications

被引：5
|
作者：
Prabhu, M. [1 ]
Sivanantham, A. [1 ]
Kannan, P. Karthick [1 ]
Vishnukanthan, V. [2 ]
Mayandi, J. [1 ]
机构：
[1] Madurai Kamaraj Univ, Sch Chem, Dept Mat Sci, Madurai 625021, Tamil Nadu, India
[2] Univ Oslo, Ctr Mat Sci & Nanotechnol, Oslo, Norway
来源：
PROCEEDING OF INTERNATIONAL CONFERENCE ON RECENT TRENDS IN APPLIED PHYSICS & MATERIAL SCIENCE (RAM 2013) | 2013年 / 1536卷
关键词：
Thin film; Sputtering; Atomic force microscopy; Optical properties; OPTICAL-PROPERTIES;
D O I：
10.1063/1.4810335
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Zinc oxide thin films deposited on glass and p-type silicon (100) substrates by DC reactive magnetron sputtering are reported here. The XRD investigations confirmed that the thin films deposited by this technique have hexagonal wurtzite structure. AFM results present the surface morphology and roughness of the deposited thin films From the optical absorption spectrum, the band gap of the thin film is found to he similar to 3.2 eV. The photoluminescence spectrum of the sample has an UV emission peak centered at 407 nm with broad visible emission in the range of 500-580 nm.
引用
收藏
页码：531 / +
页数：2
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