Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement

被引：74

作者：

Chen, Yu-Tung ^{[2
,3
]}

Lo, Tsung-Nan ^{[2
]}

Chu, Yong S. ^{[4
]}

Yi, Jaemock ^{[4
]}

Liu, Chi-Jen ^{[2
]}

Wang, Jun-Yue ^{[2
]}

Wang, Cheng-Liang ^{[2
]}

Chiu, Chen-Wei ^{[2
]}

Hua, Tzu-En ^{[2
]}

Hwu, Yeukuang ^{[2
,5
,6
,7
]}

Shen, Qun ^{[4
]}

Yin, Gung-Chian ^{[7
]}

Liang, Keng S. ^{[7
]}

Lin, Hong-Ming ^{[3
]}

Je, Jung Ho ^{[8
]}

Margaritondo, Giorgio ^{[1
]}

机构：

[1] Ecole Polytech Fed Lausanne, CH-1015 Lausanne, Switzerland

[2] Acad Sinica, Inst Phys, Taipei 115, Taiwan

[3] Tatung Univ, Dept Mat Engn, Taipei 104, Taiwan

[4] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA

[5] Natl Tsing Hua Univ, Dept Engn Sci & Syst, Hsinchu 300, Taiwan

[6] Natl Taiwan Ocean Univ, Inst Optoelect Sci, Chilung 202, Taiwan

[7] Natl Synchrotron Radiat Res Ctr, Hsinchu 300, Taiwan

[8] Pohang Univ Sci & Technol, X Ray Imaging Ctr, Pohang 790784, South Korea

来源：

NANOTECHNOLOGY | 2008年 / 19卷 / 39期

关键词：

D O I：

10.1088/0957-4484/19/39/395302

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.

引用

页数：5

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