High-Temperature Diffusion of the Acceptor Impurity Be in AlN

被引:0
|
作者
Kazarova, O. P. [1 ]
Nagalyuk, S. S. [1 ]
Soltamov, V. A. [1 ]
Muzafarova, M. V. [1 ]
Mokhov, E. N. [1 ]
机构
[1] Ioffe Inst, St Petersburg 194021, Russia
基金
俄罗斯基础研究基金会;
关键词
AlN PVT doping diffusion; LEVEL;
D O I
10.1134/S106378262306009X
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The high-temperature diffusion of an acceptor impurity of beryllium (Be) into bulk single-crystal aluminum nitride (AlN) has been studied. It is shown that the introduction of Be leads to the appearance of green luminescence of AlN, which is stable at room temperature and is observed over the entire thickness of the sample. It was shown by the method of luminescence analysis that the Be diffusion process is most efficiently realized in the temperature range from 1800 to 2100 degrees C and is characterized by extremely high diffusion coefficients D = 10(-7)cm(2)/s and 10(-6) cm(2)/s, respectively. It is shown that a prolonged diffusion process (t < 1 h) at a temperature of 2100(degrees)C leads to concentration quenching of the luminescence of near-surface AN layers with a thickness of approximate to 80 mu m, which makes it possible to estimate the concentration of beryllium impurities in the near-surface layer on the order of similar to 10(19) cm(-3).
引用
收藏
页码:401 / 404
页数:4
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