High repetition rate π-polarized 1084 nm passively Q-switched Nd:MgO: LiNbO3 laser based on 888 nm thermally boosted pumping

被引:3
|
作者
Lei, Xiaotian [1 ]
Zhao, Rui [1 ]
Ma, Jiaxin [1 ]
Liu, Hang [1 ]
Yu, Yongji [1 ]
Jin, Guangyong [1 ]
机构
[1] Changchun Univ Sci & Technol, Sch Phys, Jilin Key Lab Solid Laser Technol & Applicat, Changchun 130022, Peoples R China
基金
中国国家自然科学基金;
关键词
Nd:MgO:LiNbO3; Thermally boosted pumping; pi-polarized; 1084; nm; Passively Q-switched; ND3+;
D O I
10.1016/j.infrared.2023.104908
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We report a high-repetition-rate pi-polarized 1084 nm passively Q-switched (PQS) Nd:MgO:LiNbO3 (Nd:MgO:LN) laser under 888 nm thermally boosted pumping. The 888 nm pumping is selected based on Nd:MgO:LN crystal absorption and energy level properties. Under 813 nm pumping, the continuous wave (CW) 1084 nm average output power (AOP) increased to 2.85 W. After that, 1084 nm is suppressed and gradually disappears as the pump power increases. At the same time, the 1093 nm AOP increases, and 4.4 W of 1093 nm laser is obtained. In contrast, under 888 nm pumping, the CW 1084 nm laser AOP of 5.16 W is obtained. The thermally boosted pumping can eliminate quantum defects caused by conventional 813 nm pumping non-radiative transitions and suppress unmatched sigma-polarized 1093 nm output. Moreover, the Cr4+: YAG is replaced into the resonant cavity as the output mirror to obtain 1084 nm pulsed laser output. AOP with different initial transmission (T-0) on laser output characteristics is measured under the compact resonant cavity structure. Finally, an AOP of 3.52 W pulsed laser with a repetition rate of 24.43 kHz and the highest peak power of 5.26 kW is obtained when T-0 = 87 %, and the absorbed pump power is 20.87 W. The optical conversion efficiency is 16.87 %, and the slope efficiency is about 29.38 %.
引用
收藏
页数:7
相关论文
共 50 条
  • [41] A passively Q-switched YVO4 Raman laser with orthogonally polarized emission at 1175.4 nm and 1165.2 nm
    Wei, Lijun
    Chen, Mengting
    Zhu, Siqi
    Dai, Shibo
    Yin, Hao
    Chen, Zhenqiang
    LASER PHYSICS LETTERS, 2018, 15 (12)
  • [42] Low-Repetition-Rate High-Energy Passively Q-Switched Nd:YAG Solid Laser Based on Graphene Saturable Absorber Operating at 1064nm
    Jiang, Man
    Ren, Zhaoyu
    Lu, Baole
    Guo, Teng
    Wan, Lijuan
    Zhang, Yuping
    Bai, Jintao
    CURRENT NANOSCIENCE, 2012, 8 (01) : 60 - 63
  • [43] 888 nm laser diode end-pumped continuous wave and passively Q-switched Ho:YAG laser
    Jing, Xiaofan
    Zhang, Xinlu
    Kang, Panqiang
    Shen, Changchang
    Huang, Jinjer
    OPTICS AND LASER TECHNOLOGY, 2025, 181
  • [44] High repetition rate, q-switched and intracavity frequency doubled Nd:YVO4 laser at 671nm
    Ogilvy, H
    Withford, MJ
    Dekker, P
    Piper, JA
    OPTICS EXPRESS, 2004, 12 (15): : 3543 - 3547
  • [45] Influence of Pump Light Focused Characteristics on High Repetition Frequency 1 064 nm Passively Q-switched Laser
    Yao C.
    Fu X.
    Shen Y.
    Li W.
    Fu X.
    Faguang Xuebao/Chinese Journal of Luminescence, 2023, 44 (02): : 307 - 313
  • [46] High-power passively Q-switched Nd:YVO4 UV laser at 355 nm
    Huang, Y. J.
    Huang, Y. P.
    Chiang, P. Y.
    Liang, H. C.
    Su, K. W.
    Chen, Y. -F.
    APPLIED PHYSICS B-LASERS AND OPTICS, 2012, 106 (04): : 893 - 898
  • [47] High repetition rate passively Q-switched diode-pumped Nd:YVO4 laser
    Liu, J
    Yang, JM
    He, JL
    OPTICS AND LASER TECHNOLOGY, 2003, 35 (06): : 431 - 434
  • [48] Repetition rate continuously controllable passively Q-switched Nd:YAG bonded microchip laser
    Lei, H.
    Gong, M.
    Ping, Y.
    Qiang, L.
    LASER PHYSICS LETTERS, 2007, 4 (08) : 572 - 575
  • [49] High-power high-repetition-rate UV light at 355 nm generated by a diode-end-pumped passively Q-switched Nd:YAG laser
    Jia, Fu-qiang
    Zheng, Quan
    Xue, Qing-hua
    Bu, Yi-kun
    Qian, Long-sheng
    APPLIED OPTICS, 2007, 46 (15) : 2975 - 2979
  • [50] High-power passively Q-switched Nd:YVO4 UV laser at 355 nm
    Y. J. Huang
    Y. P. Huang
    P. Y. Chiang
    H. C. Liang
    K. W. Su
    Y.-F. Chen
    Applied Physics B, 2012, 106 : 893 - 898