atomic force microscopy;
scanning probe microscopy;
drift correction;
nanometrology;
D O I:
10.1088/1361-6501/ac9992
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
A method to correct non-linear drift distortions in all three coordinate axes of atomic force microscope (AFM) images is presented. The method uses two measurements of the sample with two fast scan axes orthogonal to each other. Both AFM images are divided into segments and the shifts of the surface features of the segments of both images are determined. From these shifts subsequently the drift of both measurements is calculated. Depending on the segments used, significant non-linearities of the drift can be corrected. The two required measurements for this method do not have to be carried out in direct succession. With this method it is therefore possible to correct drift in an existing AFM image by measuring the sample again later. Although the method has been developed for AFM, it can also be used for other scanning probe microscopes.
机构:
New York Univ Abu Dhabi NYUAD, Div Engn, Abu Dhabi, U Arab EmiratesNew York Univ Abu Dhabi NYUAD, Div Engn, Abu Dhabi, U Arab Emirates
Glia, Ayoub
Deliorman, Muhammedin
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机构:
New York Univ Abu Dhabi NYUAD, Div Engn, Abu Dhabi, U Arab EmiratesNew York Univ Abu Dhabi NYUAD, Div Engn, Abu Dhabi, U Arab Emirates
Deliorman, Muhammedin
Qasaimeh, Mohammad A.
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机构:
New York Univ Abu Dhabi NYUAD, Div Engn, Abu Dhabi, U Arab Emirates
NYU, Dept Mech & Aerosp Engn, Brooklyn, NY 11201 USANew York Univ Abu Dhabi NYUAD, Div Engn, Abu Dhabi, U Arab Emirates