Deposition of Nanostructured Tungsten Oxide Layers by a New Method: Periodic Modulation of the Deposition Angle

被引:5
|
作者
Sychov, Maxim [1 ,2 ,3 ]
Eruzin, Alexander [1 ]
Semenova, Anna [1 ]
Katashev, Pavel [1 ]
Mjakin, Sergey [1 ,5 ]
Zhukov, Mikhail V. V.
Aglikov, Aleksandr [4 ]
Nosonovsky, Michael [4 ,6 ]
Skorb, Ekaterina V. V. [4 ]
机构
[1] St Petersburg State Inst Technol, St Petersburg 190013, Russia
[2] Russian Acad Sci, Inst Silicate Chem, St Petersburg 199034, Russia
[3] Kurchatov Inst, Cent Res Inst Struct Mat Prometey, Natl Res Ctr, St Petersburg 191015, Russia
[4] ITMO Univ, Infochem Sci Ctr, St Petersburg 191002, Russia
[5] Russian Acad Sci, Inst Analyt Instrumentat, St Petersburg 198095, Russia
[6] Univ Wisconsin, Milwaukee, WI 53210 USA
基金
俄罗斯科学基金会;
关键词
DEVICES;
D O I
10.1021/acs.langmuir.3c01290
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Periodic modulation of the deposition angle (PMDA) isa new methodto deposit nanostructured and continuous layers with controllableperiodic density fluctuation. The method is used for the magnetronsputtering of a WO3 layer for an electrochromic device(ECD). An experimental study indicates that the electrochromic coloration-bleachingrate nearly doubles and the electrochromic efficiency grows by about25% in comparison with the traditional method. The ECD efficiencyrises with the increasing degree of nanostructure ordering, surfaceroughness, and homogeneity of the WO3 layer. The methodis promising for coating deposition techniques needed to produce versatiledevices with specific requirements for ion transport in surface layers,coatings, and interfaces, such as fuel cells, batteries, and supercapacitors.
引用
收藏
页码:12336 / 12345
页数:10
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