Low-frequency electrical response related to oxygen vacancies in Al3+ substituted M-type hexaferrite

被引:8
|
作者
Singh, Hodam Karnajit [1 ]
Mohapatra, Prajna P. [1 ]
Dobbidi, Pamu [1 ]
Chittari, Bheema Lingam [2 ]
机构
[1] Indian Inst Technol Guwahati, Dept Phys, Gauhati 781039, Assam, India
[2] Indian Inst Sci Educ & Res Kolkata IISER Kolkata, Mohanpur 7412646, W Bengal, India
关键词
crystal defects; oxygen vacancies; bridging effects; ES-VRH electron hopping; correlation-barrier hopping; non-debye relaxations; DIELECTRIC-PROPERTIES; MAGNETIC-PROPERTIES; CONDUCTION MECHANISM; AC CONDUCTIVITY; CRYSTALLINE; RELAXATION; DISPERSION; TRANSPORT; BEHAVIOR; POLARONS;
D O I
10.1088/1361-6463/ace45a
中图分类号
O59 [应用物理学];
学科分类号
摘要
The presence of oxygen vacancies is unavoidable in many complex metal oxide materials such as hexaferrites. This article investigates the role of crystal defects, such as oxygen vacancies, and different oxidation states of Fe ions, on the electrical conduction behaviors of Al3+ substituted Ba0.4La0.1Sr0.5AlxFe12-xO19 hexaferrites by analyzing the temperature dependent AC impedance and AC conductivity. The optimal substitution of La3+ ions and high-temperature sintering is responsible for forming oxygen vacancies while reducing Fe from Fe3+ to Fe2+ cations, as observed in structural and XPS analysis, which affects electrical conduction behaviors. The departure from ideal Debye-type relaxation behavior is also one of the effects of crystal defects. Temperature variation of relaxation time shows a sharp change at around 403 K. This may be due to different electrical entities influencing the mode of electron hopping with temperature. The activation energy calculated from the temperature dependent relaxation time confirmed the presence of electron hopping through the bridging effects of the first ionization of oxygen vacancies Fe2+-V-o(center dot)-Fe3+ below a temperature of 403 K. Above 403 K, electron hopping through different oxidation states of Fe3+ + e(-) -> Fe2+ and migration of oxygen vacancies toward the bulk surface are responsible for the conduction mechanism. The DC resistivity and AC conductivity show that the bridging effects of oxygen defects can also induce Coulomb interaction between the defect sites resulting in Efros-Shklovskii variable range hopping and correlation barrier hopping below 403 K. Above 403 K, polaron-assisted electron hopping is more desirable, as confirmed by the non-overlapping small polaron tunneling model.
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页数:17
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