Effect of pulsed electric field on the nanocrystalline growth of magnetron-sputtered TiAlN hard coatings

被引:3
|
作者
Lue, Wenzhang [1 ,2 ]
Li, Guojian [1 ]
Li, Xianliang [1 ,3 ]
Liu, Shiying [4 ]
Deng, Jiwu [1 ,2 ]
Wang, Qiang [1 ]
机构
[1] Northeastern Univ, Key Lab Electromagnet Proc Mat, Minist Educ, Shenyang 110819, Peoples R China
[2] Northeastern Univ, Sch Met, Shenyang 110819, Peoples R China
[3] Northeastern Univ, Sch Mat Sci & Engn, Shenyang 110819, Peoples R China
[4] Shenyang Univ Technol, Sch Mat Sci & Engn, Shenyang 110870, Peoples R China
关键词
Coating; Magnetron sputtering; Pulsed electric field; TiAlN; MECHANICAL-PROPERTIES; TRIBOLOGICAL BEHAVIOR; CUTTING PERFORMANCE; GRAIN-BOUNDARIES; FILM-THICKNESS; N COATINGS; DEPOSITION; MICROSTRUCTURE; FRICTION; TOOLS;
D O I
10.1016/j.ceramint.2023.10.177
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Coatings prepared by magnetron sputtering have smooth surfaces; however, their columnar structure is conducive to crack propagation, which results in a short service life. Furthermore, the heating and cooling rates of the traditional method in vacuum chambers are slow and reduce preparation efficiency. In this work, the pulsed electric field (PEF) is used to suppress columnar growth and replace the traditional heating method. The results show that the electric field force and the Joule heat of the PEF promote the short-range atomic diffusion and the nucleation rate of nanocrystals. The critical load Lc1 of the nanocrystalline PEF coating can reach 95 N; the cutting distance is improved by 100% in comparison to the uncoated tool. Additionally, the PEF reduces the heating and cooling time significantly. The effect of the PEF is better than that of the traditional heating method. The preparation efficiency improves by about 41.2%. These results indicate that the PEF can not only guarantee coating properties but also improve the preparation efficiency.
引用
收藏
页码:920 / 926
页数:7
相关论文
共 50 条
  • [21] CHARACTERIZATION OF RF MAGNETRON-SPUTTERED CrCuN AND CrNiN COATINGS BY NANOINDENTATION
    Tan, Shuyong
    Liu, Xiaohui
    Zhang, Xuhai
    Fang, Feng
    Wang, Zhangzhong
    SURFACE REVIEW AND LETTERS, 2017, 24 (07)
  • [22] Electrochemical Corrosion of Nano-Structured Magnetron-Sputtered Coatings
    Calderon, Sebastian
    Almeida Alves, Cristiana F.
    Manninen, Noora K.
    Cavaleiro, Albano
    Carvalho, Sandra
    COATINGS, 2019, 9 (10)
  • [23] Properties of reactively RF magnetron-sputtered chromium nitride coatings
    Bertrand, Ghislaine
    Savall, Catherine
    Meunier, Cathy
    Surface and Coatings Technology, 1997, 96 (2-3): : 323 - 329
  • [24] Properties of reactively RF magnetron-sputtered chromium nitride coatings
    Bertrand, G
    Savall, C
    Meunier, C
    SURFACE & COATINGS TECHNOLOGY, 1997, 96 (2-3): : 323 - 329
  • [25] Effect of copper and silver doping on the antibacterial properties of magnetron-sputtered aluminium oxide coatings
    Donkov, N.
    Zykova, A.
    Safonov, V
    Dudin, S.
    Yakovin, S.
    Kussovski, V
    Avramov, L.
    21ST INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON AND ION TECHNOLOGIES, 2020, 1492
  • [26] On the development of texture during growth of magnetron-sputtered CrN
    Schell, N
    Petersen, JH
    Bottiger, J
    Mücklich, A
    Chevallier, J
    Andreasen, KP
    Eichhorn, F
    THIN SOLID FILMS, 2003, 426 (1-2) : 100 - 110
  • [27] Thermal stability of sputtered nanocrystalline hard coatings
    Willmann, H
    Mayrhofer, PH
    Beschliesser, M
    Mitterer, C
    PRAKTISCHE METALLOGRAPHIE-PRACTICAL METALLOGRAPHY, 2004, 41 (08): : 397 - 408
  • [28] SURFACE ANALYTICAL STUDIES OF MAGNETRON-SPUTTERED TITANIUM NITRIDE (TINX) COATINGS
    MEENAN, BJ
    ANDERSON, CA
    BROWN, NMD
    HEWITT, JA
    ADVANCES IN ENGINEERING MATERIALS, 1995, 99-1 : 193 - 200
  • [29] Fracture mechanics tests for measuring the adhesion of magnetron-sputtered TiN coatings
    Mueller, D., 1600, Publ by VSP Int Sci Publ, Zeist, Netherlands (07):
  • [30] STRUCTURE AND PROPERTIES OF MAGNETRON-SPUTTERED TI-V-N COATINGS
    KNOTEK, O
    BARIMANI, A
    BOSSERHOFF, B
    LOFFLER, F
    THIN SOLID FILMS, 1990, 193 (1-2) : 557 - 564