Thermoelectrical Properties of ITO/Pt, In2O3/Pt and ITO/In2O3 Thermocouples Prepared with Magnetron Sputtering

被引:5
|
作者
Liu, Yantao [1 ]
Shi, Peng [2 ]
Ren, Wei [2 ]
Huang, Rong [1 ]
机构
[1] Xian Univ Technol, Dept Elect Engn, Xian 710048, Peoples R China
[2] Xi An Jiao Tong Univ, Key Lab Minist Educ & Int Ctr Dielect Res, Sch Elect & Informat Engn, Elect Mat Res Lab, Xian 710049, Peoples R China
关键词
ITO thin film; In2O3 thin film; thermocouples; magnetron sputtering; TEMPERATURE-SENSITIVE-PAINT; THIN-FILM THERMOCOUPLES; HEAT-TRANSFER; CALIBRATION;
D O I
10.3390/cryst13030533
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
ITO/Pt, In2O3/Pt and ITO/In2O3 thermocouples were prepared by the radio frequency (RF) magnetron sputtering method. The XRD results showed that all the annealed ITO and In2O3 films annealed at high temperature present a cubic structure. Scanning electron microscope results showed that the thickness of the ITO and In2O3 films could reach 1.25 mu m and 1.21 mu m, respectively. The ITO/Pt and In2O3/Pt thin film thermocouples could obtain an output voltage of 68.7 mV and 183.5 mV, respectively, under a 900 degrees C temperature difference, and at the same time, the Seebeck coefficient reached 76.1 mu V/degrees C and 203.9 mu V/degrees C, respectively. For the ITO/In2O3 thermocouple, the maximum value of the output voltage was 165.7 mV under a 1200 degrees C temperature difference, and the Seebeck coefficient was 138.1 mu V/degrees C. Annealing under different atmosphere conditions under 1000 degrees C, including vacuum, air and nitrogen atmospheres, resulted in values of the Seebeck coefficient that were 138.2 mu V/degrees C, 135.5 mu V/degrees C and 115.7 mu V/degrees C, respectively.
引用
收藏
页数:11
相关论文
共 50 条
  • [41] Hyperfine interactions and site occupancy in Sn-doped In2O3 (ITO)
    Binczycka, H
    Uhrmacher, M
    Elidrissi-Moubtassim, ML
    Jumas, JC
    Schaaf, P
    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2005, 242 (05): : 1100 - 1107
  • [42] Magnetic and magnetotransport properties in Cu and Fe co-doped bulk In2O3 and ITO
    Ho, H. W.
    Zhao, B. C.
    Xia, B.
    Huang, S. L.
    Tao, J. G.
    Huan, A. C. H.
    Wang, L.
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2008, 20 (47)
  • [43] In2O3/ITO薄膜热电偶动态特性研究
    张杰
    王高
    李志玲
    刘云东
    梁海坚
    黄漫国
    传感器与微系统, 2022, 41 (08) : 37 - 40+44
  • [44] Comparison of ITO, In2O3:Zn and In2O3:H transparent conductive oxides as front electrodes for silicon heterojunction solar cell applications
    Li, Sen
    Shi, Zhifeng
    Tang, Zhaojun
    Li, Xinjian
    VACUUM, 2017, 145 : 262 - 267
  • [45] IN2O3 AND IN2O3-SN (ITO) FILMS BY POST-OXIDATION OF METAL-FILMS
    RAVIENDRA, D
    SHARMA, JK
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1985, 88 (01): : K83 - K86
  • [46] ELECTRICAL PROPERTIES OF IN2O3
    DEWIT, JHW
    JOURNAL OF SOLID STATE CHEMISTRY, 1973, 8 (02) : 142 - 149
  • [47] Influence of annealing in N2 on the properties of In2O3: Sn thin films prepared by direct current magnetron sputtering
    Lin, Limei
    Lai, Fachun
    Qu, Yan
    Gai, Rongquan
    Huang, Zhigao
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2007, 138 (02): : 166 - 171
  • [48] Electrical properties of In2O3 and ITO thin films formed by solution process using In(acac)3 precursors
    Jain, Puneet
    Nakabayashi, Yuji
    Haga, Ken-ichi
    Tokumitsu, Eisuke
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59 (SC)
  • [49] Hydrogen adsorption on In2O3(111) and In2O3(110)
    Posada-Borbon, Alvaro
    Gronbeck, Henrik
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2020, 22 (28) : 16193 - 16202
  • [50] Reactive deposition of In2O3 films on In2O3 substrates
    Muranaka, Shigetoshi
    Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy, 1996, 43 (07): : 930 - 933