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- [22] Influence of O(3P)/O2 Flux on the Atomic Layer Deposition of B2O3 Using Trimethyl Borate at Room Temperature JOURNAL OF PHYSICAL CHEMISTRY C, 2020, 124 (47): : 25846 - 25858
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- [25] Film properties of low temperature HfO2 grown with H2O, O3, or remote O2-plasma JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (01):
- [26] Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applications Nanoscale Research Letters, 8
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- [29] Bis(μ-3-nitrobenzene-1,2-dicarboxylato)-κ8O1,O2:O2,O3;O3,O2:O2,O1-bis[triaqua(2carboxy-3-nitrobenzoato-κ2O,O′) lanthanum(III)] dihydrate ACTA CRYSTALLOGRAPHICA SECTION C-STRUCTURAL CHEMISTRY, 2007, 63 (01): : M10 - M12
- [30] Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant JOURNAL OF PHYSICAL CHEMISTRY C, 2018, 122 (39): : 22519 - 22529